| 1. | Zno thin films were deposited on silicon ( si ) and glass substrate by reactive radio frequency sputtering ( rf ) technique with zinc target in the mixed gas of ar ando2 , and used zno buffer improving the quality of zno thin film . the effects of parameters on the thickness , composition , texture , morphology , optical properties and electrical properties of zno thin films had been systematically investigated by means of xrd , xps , sem , afm , pl and hall test system
采用x射线衍射( xrd ) 、 x射线光电子能谱( xps ) 、扫描电子显微镜( sem ) 、原子力显微镜( afm ) ,光致发光谱( pl )和霍尔效应测试技术系统研究了溅射工艺和退火工艺对zno薄膜的厚度、成分、织构、表面形貌、光学性能和电学性能的影响规律。 |
